Exhaust flow control ring for semiconductor deposition apparatus



FIG. 1 is a perspective view of an exhaust flow control ring for semiconductor deposition apparatus,

FIG. 2 is a front elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 3 is a rear elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 4 is a left side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 5 is a right side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 6 is another view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 7 is another view of the exhaust flow control ring for semiconductor deposition apparatus; and,

FIG. 8 is a rear perspective view of the exhaust flow control ring for semiconductor deposition apparatus. 

CLAIM The ornamental design for an exhaust flow control ring for semiconductor deposition apparatus, as shown and described. 